Valence-band photoemission of the H-plasma annealed (100) textured CVD diamond surface

Surface Science

Volumn 365, Issue 3, 1996, Pages 825-830

  Francz, G ^a   Kania, P ^a   Oelhafen, P ^a   Schedel Niedrig, T ^b   Schlogl R ^b   Locher, R ^c  

^a UNIVERSITY OF BASEL   (Switzerland)

^b FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

^c FRAUNHOFER INSTITUTE FOR APPLIED SOLID STATE PHYSICS IAF   (Germany)

Author keywords

Diamond; Near edge extended X ray absorption fine structure (NEXAFS); Photoemission; Plasma processing; Polycrystalline surfaces; Soft X ray photoelectron spectroscopy; Surface electronic phenomena; Surface relaxation and reconstruction

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; DIAMONDS; ELECTRON ENERGY LEVELS; FERMI LEVEL; HYDROGEN; PHOTOEMISSION; PLASMA APPLICATIONS; RELAXATION PROCESSES; SURFACE TREATMENT; SYNCHROTRON RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

NEAR EDGE EXTENDED X RAY ABSORPTION FINE STRUCTURE; PLASMA PROCESSING; SURFACE ELECTRONIC PHENOMENA; SURFACE RECONSTRUCTION; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY; VALENCE BAND PHOTOEMISSION;

SURFACE PHENOMENA;

EID: 0030270252     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(96)00756-X     Document Type: Article

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