Formation of Ti-Al-N thin films by the dynamic ion mixing method

Surface and Coatings Technology

Volumn 84, Issue 1-3, 1996, Pages 409-413

  Takano, Ichiro ^a   Nakamura, Isao ^a   Kamiya, Makoto ^a   Yoshida, Hiroyuki ^a  

^a KOGAKUIN UNIVERSITY   (Japan)

Author keywords

Dynamic ion beam mixing; Ti Al N thin film

Indexed keywords

ALUMINUM; COMPOSITION; CORROSION RESISTANCE; HARDNESS; HIGH TEMPERATURE PROPERTIES; ION BEAMS; MIXING; NITRIDES; SPUTTERING; TITANIUM; WEAR RESISTANCE; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM TITANIUM NITRIDE; DYNAMIC ION MIXING; REACTIVE SPUTTERING;

THIN FILMS;

EID: 0030270116     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(96)02844-7     Document Type: Article

References (5)

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3. Y. Tanaka, T.M. Gür, M. Kelly, S.B. Hagstrom and T. Ikeda, Thin Solid Films, 228 (1993) 238.
4. D.C. Grahame, J. Electrochem. Soc., 99 (1952) 370C.
5. J.F. Moulder, W.F. Stickle, P.E. Sobol and K.D. Bomben, Handbook of X-ray Photoelectron Spectroscopy, Perkin-Elmer Corporation, Physical Electronics Division, Eden Prairie, MN, 1992.