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Volumn 366, Issue 1, 1996, Pages 51-59

Interaction of Sn atoms with the intrinsic dangling-bond states of Si(111)-(7 × 7)

Author keywords

Adatoms; Chemisorption; Growth; Metal semiconductor interfaces; Scanning tunneling microscopy; Scanning tunneling spectroscopy; Silicon; Surface chemical reaction; Surface relaxation and reconstruction; Surface structure; Tin

Indexed keywords

ADSORPTION; ATOMS; CHEMICAL BONDS; CHEMISORPTION; FERMI LEVEL; GROWTH (MATERIALS); INTERFACES (MATERIALS); RELAXATION PROCESSES; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTING SILICON; SURFACE STRUCTURE; TIN;

EID: 0030269535     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(96)00799-6     Document Type: Article
Times cited : (35)

References (35)
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    • note
    • We normalize differential curves using the method proposed by Feenstra [21]. The essence of this method is to transform the curves so that they represent the local density of states as closely as possible, and at the same time avoid the divergence of (dI/dV)/(I/V) curves at the band edges and overweighting of the contribution of higher bias voltages to the tunneling current. This is achieved via normalization of the I/V ratio by a broadening procedure which involves convolution of I/V with the exponential function with a weighting factor. This procedure gives the normalized ratio I/V and thus normalized differential curves (dI/dV)/(I/V) can be calculated. The effect of the described procedure is to emphasize and smooth surface state peaks without changing their position on the energy scale. A small peak at ∼0 V seen in Fig. 4a is an anomaly of this broadening procedure for the clean Si(111)-(7 × 7) surface.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.