Effects of plasma induced charges on thin oxide of CMOS technologies

Microelectronics Journal

Volumn 27, Issue 7, 1996, Pages 599-609

  Reimbold, Gilles ^a  

^a CEA LETI   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTRIC CHARGE; INTEGRATED CIRCUIT MANUFACTURE; OXIDES; REACTIVE ION ETCHING; SEMICONDUCTOR PLASMAS; THIN FILMS;

ANTENNA EFFECTS; FOWLER-NORDHEIM INJECTION; PLASMA INDUCED CHARGES; THRESHOLD VOLTAGES;

MICROELECTRONIC PROCESSING;

EID: 0030269373     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/0026-2692(95)00101-8     Document Type: Article

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