A mutant of Escherichia coli hyper-resistant to a number of DNA damaging agents: Location of the mutational site

Journal of Photochemistry and Photobiology B: Biology

Volumn 36, Issue 1, 1996, Pages 47-53

  Ahmad, S I ^a  

^a NOTTINGHAM TRENT UNIVERSITY   (United Kingdom)

Author keywords

DNA damage; Hyper DNA repair; SOS genes

Indexed keywords

HYDROGEN PEROXIDE; METHOXSALEN; NALIDIXIC ACID; NOVOBIOCIN;

ALLELE; ARTICLE; BACTERIAL GENE; BACTERIAL GENETICS; BACTERIUM MUTANT; CONTROLLED STUDY; DNA DAMAGE; DNA REPAIR; ESCHERICHIA COLI; GENE LOCATION; GENE LOCUS; GENE MUTATION; GENETIC REGULATION; NONHUMAN; PHENOTYPE; PHOTOCHEMISTRY; PLASMID; PRIORITY JOURNAL; REGULON; ULTRAVIOLET A RADIATION; ULTRAVIOLET C RADIATION;

ALLELES; DNA DAMAGE; DNA REPAIR; DNA, BACTERIAL; DRUG RESISTANCE, MICROBIAL; ESCHERICHIA COLI; GENETIC COMPLEMENTATION TEST; HYDROGEN PEROXIDE; METHOXSALEN; MUTAGENESIS; NALIDIXIC ACID; NOVOBIOCIN; PHENOTYPE; ULTRAVIOLET RAYS;

BACTERIA (MICROORGANISMS); ESCHERICHIA COLI;

EID: 0030265995     PISSN: 10111344     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1011-1344(96)07329-0     Document Type: Article

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