Crystallization and martensitic transformation of sputter-deposited Ti-Ni thin films

Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals

Volumn 60, Issue 10, 1996, Pages 921-927

  Kawamura, Yoshio ^a   Gyobu, Atsuo ^b   Horikawa, Hiroshi ^c   Saburi, Toshio ^a  

^a OSAKA UNIVERSITY   (Japan)

^b NIIHAMA NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^c Hurukawa Techno Material Co Ltd   (Japan)

Author keywords

Amorphous; Crystallization; Shape memory; Sputtering; Thin film; Titanium nickel; Transmission electron microscopy

Indexed keywords

AMORPHOUS FILMS; COMPOSITION; CRYSTALLIZATION; DIFFERENTIAL SCANNING CALORIMETRY; INTERMETALLICS; MARTENSITIC TRANSFORMATIONS; METALLIC FILMS; MICROANALYSIS; SHAPE MEMORY EFFECT; SPUTTER DEPOSITION; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRON PROBE MICROANALYSIS; TITANIUM NICKEL ALLOYS;

TITANIUM ALLOYS;

EID: 0030264050     PISSN: 00214876     EISSN: None     Source Type: Journal    
DOI: 10.2320/jinstmet1952.60.10_921     Document Type: Article

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