Electronic structure of passive films formed on molybdenum-containing ferritic stainless steels

Journal of the Electrochemical Society

Volumn 143, Issue 10, 1996, Pages 3088-3094

  Hakiki, N E ^a   Da Cunha Belo, M ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; CAPACITANCE; COMPOSITION EFFECTS; COMPUTER SIMULATION; ELECTRIC VARIABLES MEASUREMENT; ELECTRONIC STRUCTURE; ENERGY GAP; MOLYBDENUM; NUMERICAL ANALYSIS; PHOTONS; SCHOTTKY BARRIER DIODES; STAINLESS STEEL;

PASSIVE FILMS; PHOTOELECTROCHEMICAL MEASUREMENTS;

SEMICONDUCTING FILMS;

EID: 0030263250     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837169     Document Type: Article

References (38)

1. A. Di Paola, Electrochim. Acta, 34, 203 (1989).
2. A. Di Paola, D. Shukla, and U. Stimming, Electrochim. Acta, 36, 345 (1991).
3. A. M. P. Simoes, M. G. S. Ferreira, B. Rondot, and M. Da Cunha Belo, This Journal, 137, 82 (1990).
4. R. Babic, and M. Metikos-Hukovic, J. Electroanal. Chem., 358, 143 (1993).
5. C. Sunseri, S. Piazza, A. Di Paola, and F. Di Quarto, This Journal, 134, 2410 (1987).
6. A. Di Paola, F. Di Quarto, and C. Sunseri, Corros. Sci., 26, 935 (1986).
7. P. Schmuki and H. Bohni, This Journal, 139, 7 (1992).
8. A. M. P. Simoes, M. G. S. Ferreira, G. Lorang, and M. Da Cunha Belo, Electrochim. Acta, 36, 315 (1991).
9. G. Lorang, M. Da Cunha Belo, and J. P. Langeron, J. Vac. Sci. Technol., A5(4), 1213 (1987).
10. G. Lorang, F. Basile, M. Da Cunha Belo, and J. P. Langeron, Surf. Interface Anal., 12, 424 (1988).
11. M. H. Dean and U. Summing, J. Electroanal. Chem., 228, 135 (1987).
12. U. Summing and J. W. Schultze, Ber. Bunsenges. Phys. Chem., 80, 129 (1976).
13. U. Summing, in Passivity of Metals and Semiconductors, M. Froment, Editor, p. 477, Elsevier, Amsterdam (1983).
14. F. M. Delnick and N. Hackerman, This Journal, 126, 732 (1979).
15. S. M. Wilhelm, K. S. Yun, L. W. Ballenger, and N. Hackerman, ibid., 126, 419 (1979).
16. S. M. Wilhelm and N. Hackerman, ibid., 128, 1668 (1981).
17. K. Azumi, T. Ohtsuka, and N. Sato, ibid., 133, 1326 (1986).
18. K. Azumi, T.Ohtsuka, and N. Sato, ibid., 134, 1352 (1987).
19. P. C. Searson, R. M. Latanision, and U. Summing, ibid., 135, 1358 (1988).
20. J. H. Kennedy and K. W. Freses, Jr., ibid., 125, 723 (1978).
21. J. W. A. Sholt and W. Ch. Van Geel, Philips Res. Rep., 8, 47 (1953).
22. L. Young, Trans. Faraday Soc., 51, 1250 (1955).
23. E. C. Dutoit, R. L. Van Meirhaeghe, F. Cardon, and W. P. Gomes, Ber. Bunsenges. Phys. Chem., 79, 1206 (1975).
24. R. L. Van Meirhaegh, E. C. Dutoit, F. Cardon, and W. P. Gomes, Electrochim. Acta, 20, 995 (1975).
25. D. M. Tench and E. Yeager, This Journal, 120, 164 (1973).
26. H. J. Eagle and B. Ilschmer, Z. Elektrochem., 59, 716 (1955).
27. W. W. Gartner, Phys. Rev., 116, 84 (1959).
28. U. Stimming, in Passivity of Metals and Semiconductors, M. Froment, Editor, p. 509, Elsevier, Amsterdam (1983).
29. A. R. Newmark and U. Stimming, J. Electroanal. Chem., 204, 197, (1986).
30. U. Stimming, Langmuir, 3, 423 (1987).
31. U. Stimming, Electrochim. Acta, 31, 415 (1987).
32. B. Lovrecek and J. Sefaja, ibid., 17, 1151 (1972).
33. E. Mahla and N. Nielsen, This Journal, 93, 1 (1948).
34. M. Tomkiewicz, ibid., 126, 2220 (1979).
35. G. Nogami, ibid., 132, 76 (1978).
36. G. Nogami, ibid., 133, 525 (1978).
37. C. L. McBee and J. Kruger, Electrochim. Acta, 17, 1337 (1972).
38. J. Kruger, G. G. Long, Z. Zhang, and D. K. Tanaka, Corros. Sci., 31, 111 (1990).