Fabrication of metal nanocrystalline films by gas-deposition method

Materials Science and Engineering: A

Volumn 217-218, Issue , 1996, Pages 344-347

  Sasaki, Y ^a   Shiozawa, K ^a   Tanimoto, H ^a   Iwamoto, Y ^b   Kita, Eiji ^a   Tasaki, A ^a  

^a UNIVERSITY OF TSUKUBA   (Japan)

^b DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

Fabrication; Gas deposition

Indexed keywords

AGGLOMERATION; ATOMIC FORCE MICROSCOPY; COERCIVE FORCE; DEPOSITION; EVAPORATION; FABRICATION; GASES; GRAIN SIZE AND SHAPE; MORPHOLOGY; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY;

GAS DEPOSITION; HIGH PURITY GAS; NANOCRYSTALLINE FILMS;

NICKEL;

EID: 0030263037     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5093(96)10325-7     Document Type: Article

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