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Volumn 380, Issue 1-2, 1996, Pages 183-185

Recent results on chemical-vapor-deposited diamond microstrip detectors

(45)  Bauer, C a   Baumann, I a   Colledani, C b   Conway, J c   Delpierre, P d   Djama, F b   Dulinski, W b   Fallou, A d   Gan, K K e   Gilmore, R S f   Grigoriev, E d   Hallewell, G d   Han, S g   Hessing, T h   Hubec, J i   Husson, D b   Kagan, H e   Kania, D j   Kass, R e   Kinnison, W g   more..

b CRN   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRONS; MICROSTRIP DEVICES; RADIATION DETECTORS; RADIATION HARDENING; SIGNAL TO NOISE RATIO;

EID: 0030262645     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-9002(96)00376-2     Document Type: Article
Times cited : (3)

References (12)
  • 11
    • 0041288709 scopus 로고    scopus 로고
    • The silicon detectors were produced by CSEM, Maladiere 71, Case Postale 41, Neuchatel, Switzerland CH-2007
    • The silicon detectors were produced by CSEM, Maladiere 71, Case Postale 41, Neuchatel, Switzerland CH-2007.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.