BaTio3/SrTiO3 thin films grown by an MBE method using oxygen radicals

Materials Science and Engineering B

Volumn 41, Issue 1, 1996, Pages 148-151

  Shigetani, Hisashi ^a   Fujimoto, Masayuki ^a   Sugimura, Wataru ^b   Matsui, Yoshio ^c   Tanaka, Junzo ^c  

^a TAIYO YUDEN CO LTD   (Japan)

^b WASEDA UNIVERSITY   (Japan)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Lattice; Thin films; X ray diffraction

Indexed keywords

FERROELECTRIC MATERIALS; LATTICE CONSTANTS; OXYGEN; SUBSTRATES; X RAY DIFFRACTION;

FERROELECTRIC THIN FILM; OXYGEN RADICALS;

THIN FILMS;

EID: 0030262580     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)01642-X     Document Type: Article

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