Evaluation of C15TCNQ Langmuir-Blodgett ultrathin films on aluminum thin films by attenuated total reflection measurements

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 10, 1996, Pages 5466-5470

  Kato, Keizo ^a   Aoki, Yusuke ^a   Ohashi, Kenichi ^a   Shinbo, Kazunari ^a   Kaneko, Futao ^a  

^a NIIGATA UNIVERSITY   (Japan)

Author keywords

Attenuated total reflection; C15TCNQ; Deposition process; Langmuir Blodgett film; Structure

Indexed keywords

ATTENUATED TOTAL REFLECTION MEASUREMENTS; TETRACYANOQUINODIMETHANE;

ELECTRIC PROPERTIES; FILM PREPARATION; METALLIC FILMS; MONOLAYERS; OXIDES; PERMITTIVITY; SUBSTRATES; THIN FILMS; ULTRATHIN FILMS;

LANGMUIR BLODGETT FILMS;

EID: 0030262298     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.5466     Document Type: Article

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