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Volumn 233-237, Issue PART II, 1996, Pages 1310-1317
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Accumulation of stable optical centres in silica glasses under pulse beam irradiation
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL DEFECTS;
DOSIMETRY;
ELECTRON ABSORPTION;
ELECTRON BEAMS;
ELECTRON TRANSITIONS;
HIGH TEMPERATURE EFFECTS;
RADIATION EFFECTS;
ELECTRON PULSE REPETITION RATE;
STABLE OPTICAL CENTRES;
FUSED SILICA;
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EID: 0030262218
PISSN: 00223115
EISSN: None
Source Type: Journal
DOI: 10.1016/s0022-3115(96)00187-0 Document Type: Article |
Times cited : (16)
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References (2)
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