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Volumn 79, Issue 10, 1996, Pages 2763-2766

Isothermal oxidation behavior of Mo-Si-B intermetallics at 1450°C

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; HIGH TEMPERATURE EFFECTS; HIGH TEMPERATURE PROPERTIES; MOLYBDENUM COMPOUNDS; OXIDATION; SYNTHESIS (CHEMICAL);

EID: 0030260461     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1996.tb09046.x     Document Type: Article
Times cited : (82)

References (12)
  • 1
    • 0026899319 scopus 로고
    • Engineering Aspects of Creep of Molybdenum Disilicide
    • S. Bose, "Engineering Aspects of Creep of Molybdenum Disilicide," Mater. Sci. Eng., A155 [1-2] 217-25 (1992).
    • (1992) Mater. Sci. Eng. , vol.A155 , Issue.1-2 , pp. 217-225
    • Bose, S.1
  • 2
    • 84976164474 scopus 로고
    • 2-Based High-Temperature Structural Silicides
    • 2-Based High-Temperature Structural Silicides," MRS Bull., 18 [7] 35-40 (1993).
    • (1993) MRS Bull. , vol.18 , Issue.7 , pp. 35-40
    • Petrovic, J.J.1
  • 4
    • 84977248675 scopus 로고
    • Structure and Chemistry of Oxide Films Thermally Grown on Molybdenum Silicides
    • R. W. Bartlett, J. W. McCamont, and P. R. Gage, "Structure and Chemistry of Oxide Films Thermally Grown on Molybdenum Silicides," J. Am. Ceram. Soc., 48 [11] 551-58 (1965).
    • (1965) J. Am. Ceram. Soc. , vol.48 , Issue.11 , pp. 551-558
    • Bartlett, R.W.1    McCamont, J.W.2    Gage, P.R.3
  • 5
    • 84975363018 scopus 로고
    • High-Temperature Oxidation; II. Molybdenum Silicides
    • J. B. Berkowitz-Mattuck and R. R. Dils, "High-Temperature Oxidation; II. Molybdenum Silicides," J. Electrochem. Soc., 112 [6] 583-89 (1965).
    • (1965) J. Electrochem. Soc. , vol.112 , Issue.6 , pp. 583-589
    • Berkowitz-Mattuck, J.B.1    Dils, R.R.2
  • 6
    • 0001208148 scopus 로고
    • High Temperature Properties of Refractory Intermetallics
    • D. L. Anton and D. M. Shah, "High Temperature Properties of Refractory Intermetallics," Mater. Res. Soc. Symp. Proc., 213, 733-39 (1991).
    • (1991) Mater. Res. Soc. Symp. Proc. , vol.213 , pp. 733-739
    • Anton, D.L.1    Shah, D.M.2
  • 9
    • 4243132975 scopus 로고    scopus 로고
    • Card 9-292, JCPDS-International Center for Diffraction Data, Newtowne Square, PA, 1993
    • Card 9-292, JCPDS-International Center for Diffraction Data, Newtowne Square, PA, 1993.
  • 10
    • 4243189538 scopus 로고    scopus 로고
    • Card 39-1425, JCPDS-International Center for Diffraction Data, Newtowne Square, PA, 1993
    • Card 39-1425, JCPDS-International Center for Diffraction Data, Newtowne Square, PA, 1993.
  • 11
    • 0020703747 scopus 로고
    • Oxygen Transport through Glass Layers Formed by a Gel Process
    • J. Schlichting, "Oxygen Transport through Glass Layers Formed by a Gel Process," J. Non-Cryst. Solids, 63 173-81 (1984).
    • (1984) J. Non-Cryst. Solids , vol.63 , pp. 173-181
    • Schlichting, J.1
  • 12
    • 0019019903 scopus 로고
    • Characterization of Thin Film Molybdenum Silicide Oxide
    • T. Mochizuki and M. Kashiwagi, "Characterization of Thin Film Molybdenum Silicide Oxide," J. Electrochem. Soc., 127 [5] 1128-35 (1980).
    • (1980) J. Electrochem. Soc. , vol.127 , Issue.5 , pp. 1128-1135
    • Mochizuki, T.1    Kashiwagi, M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.