Thermal oxynitridation of silicon in N2O ambients

Journal of the Electrochemical Society

Volumn 143, Issue 10, 1996, Pages 3372-3376

  Kim, Keunjoo ^a   Lee, Young Hee ^a   Suh, Moon Suhk ^a   Youn, Chang Joo ^a   Lee, Kee Bang ^a   Lee, Hyung Jae ^a  

^a Chonbuk National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTION ENERGIES; OXIDATION KINETICS; THERMAL OXYNITRIDATION;

FILM GROWTH; GROWTH KINETICS; NITRIDING; NITROGEN OXIDES; OXIDATION; REACTION KINETICS; SEMICONDUCTING SILICON;

DIELECTRIC FILMS;

EID: 0030259555     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837214     Document Type: Article

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