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Volumn 37, Issue 4, 1996, Pages 432-439

Synchrotron radiation X-ray lithography for ULSI fabrication

Author keywords

DRAM; Hot carrier; Overlay; Resist; Synchrotron radiation; X ray lithography

Indexed keywords

ANNEALING; HOT CARRIERS; MOSFET DEVICES; PERFORMANCE; SYNCHROTRON RADIATION; X RAY LITHOGRAPHY;

EID: 0030259455     PISSN: 0547051X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (1)

References (9)
  • 1
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    • Sub-half-micron Metal-oxide-semiconductor Device Fabrication Using a Compact Synchrotron Radiation System
    • K. Fujii, et al., "Sub-half-micron Metal-oxide-semiconductor Device Fabrication Using a Compact Synchrotron Radiation System," J. Vac. Sci. Technol., B11, pp. 2897-2901, 1993.
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    • Fujii, K.1
  • 2
    • 0008005740 scopus 로고
    • Applicability Test for Synchrotron Radiation X-ray Lithography in 64 Mb Dynamic Random Access Memory Fabrication Processes
    • K. Fujii, et al., "Applicability Test for Synchrotron Radiation X-ray Lithography in 64 Mb Dynamic Random Access Memory Fabrication Processes," J. Vac. Sci. Technol., B12, pp. 3949-3953, 1994.
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  • 3
    • 0038093491 scopus 로고
    • X-ray Mask Fabrication Using Advanced Optical Lithography
    • S. Tsuboi and K. Suzuki, "X-ray Mask Fabrication Using Advanced Optical Lithography," J. Vac. Sci. Technol., B11, pp. 2994-2996, 1993.
    • (1993) J. Vac. Sci. Technol. , vol.B11 , pp. 2994-2996
    • Tsuboi, S.1    Suzuki, K.2
  • 4
    • 0001031825 scopus 로고
    • Sputtering of Fibrous-structured Low-stress Ta Films for X-ray Masks
    • T. Yoshihara and K. Suzuki, "Sputtering of Fibrous-structured Low-stress Ta Films for X-ray Masks," J. Vac. Sci. Technol., B12, pp. 4001-4004, 1994.
    • (1994) J. Vac. Sci. Technol. , vol.B12 , pp. 4001-4004
    • Yoshihara, T.1    Suzuki, K.2
  • 5
    • 0001029427 scopus 로고
    • Commissioning of Aurora: The Smallest Synchrotron Light Source
    • H. Yamada, "Commissioning of Aurora: The Smallest Synchrotron Light Source," J. Vac. Sci. Technol., B8, pp. 1628-1632, 1990.
    • (1990) J. Vac. Sci. Technol. , vol.B8 , pp. 1628-1632
    • Yamada, H.1
  • 6
    • 5244241664 scopus 로고
    • Highly Reliable Oscillating Mirror System for Synchrotron Radiation Lithography
    • H. Kuroda, et al., "Highly Reliable Oscillating Mirror System for Synchrotron Radiation Lithography," J. Vac. Sci. Technol., B9, pp. 3218-3221, 1991.
    • (1991) J. Vac. Sci. Technol. , vol.B9 , pp. 3218-3221
    • Kuroda, H.1
  • 7
    • 0028741385 scopus 로고
    • 22 nm Overlay Accuracy of Synchrotron Radiation Stepper Using an Improved Chromatic Bifocus Alignment System
    • S. Hamada, et al., "22 nm Overlay Accuracy of Synchrotron Radiation Stepper Using an Improved Chromatic Bifocus Alignment System," SPIE, 2194, pp. 73-82, 1994.
    • (1994) SPIE , vol.2194 , pp. 73-82
    • Hamada, S.1
  • 8
    • 0027656456 scopus 로고
    • Reduced Hot-Carrier Reliability Degradation of X-ray Irradiated MOSFETs in a 0.25 mm CMOS Technology with Ultra-Thin Gate Oxide
    • A. Acovic, et al., "Reduced Hot-Carrier Reliability Degradation of X-ray Irradiated MOSFETs in a 0.25 mm CMOS Technology with Ultra-Thin Gate Oxide," Solid-State Electronics, 36, pp. 1353-1355, 1993.
    • (1993) Solid-State Electronics , vol.36 , pp. 1353-1355
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  • 9
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    • Effects of Synchrotron Radiation X-ray Irradiation on Hot Carrier Reliability in Subquarter-Micrometer NMOSFETs
    • T. Tsuchiya, et al., "Effects of Synchrotron Radiation X-ray Irradiation on Hot Carrier Reliability in Subquarter-Micrometer NMOSFETs," IEICE Trans. Electron, E76-C, pp. 506-510, 1993.
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    • Tsuchiya, T.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.