Plasma polymerization of tetraethoxysilane on aluminum granules for corrosion protection

Thin Solid Films

Volumn 287, Issue 1-2, 1996, Pages 169-173

  Iriyama, Y ^a   Ihara, T ^b   Kiboku, M ^b  

^a UNIVERSITY OF YAMANASHI   (Japan)

^b KINKI UNIVERSITY   (Japan)

Author keywords

Aluminium; Corrosion; Plasma processing and deposition

Indexed keywords

ALUMINUM CORROSION; CORROSION RESISTANCE; PLASMA APPLICATIONS; POLYMERIZATION; POLYSILANES; PROTECTIVE COATINGS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ALUMINUM GRANULES; TETRAETHOXYSILANE PLASMA POLYMERIZATION;

CORROSION PROTECTION;

EID: 0030259189     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08780-9     Document Type: Article

References (11)

1. F. Homilius, F. Heilmann, J. Werner and W. Grunewald, Phys. Status Solidi A, 137 (1993) 145.
2. F.J. Boerio, G.D. Davis, J.E. deVries, C.E. Miller, K.L. Mittal, R.L. Opila and H.K. Yasuda, Crit. Rev. Surf. Chem., 3 (1993) 81.
3. H.P. Schreiber, M.R. Wertheimer and A.M. Wrobel, Thin Solid Films, 72 (1980) 487.
4. A.M. Wrobel and M.R. Wertheimer, in R. d'Agostino (ed.), Plasma Deposition, Treatment, and Etching of Polymers, Academic Press, Boston, MA, 1990, Chapter 3.
5. W. Petasch, K. Baumgaetner, E. Rauchle and M. Walker, Surf. Coat. Technol., 59 (1993) 301.
6. K.D. Conners, W.J. van Ooij, S.J. Clarson and A. Sabata, J. Appl. Polym. Sci., Appl. Polym. Symp., 54 (1994) 167.
7. M. Ishii, K. Nakashima, I. Tajima and M. Yamamoto, Appl. Phys. Lett., 58 (1991) 1378.
8. H. Yasuda, T.J. O'Keefe, D.L. Cho and B.K. Sun, J. Appl. Polym. Sci., Appl. Polym. Symp., 46 (1990) 243.
9. D.L. Cho and H. Yasuda, J. Appl. Polym. Sci., Appl. Polym. Symp., 42 (1988) 233.
10. K. Sato, Y. Iriyama, D.L. Cho and H. Yasuda, J. Vac. Sci. Technol., A7 (1989) 195.
11. H. Yasuda, Plasma Polymerization, Academic Press, Orlando, FL, 1985, p. 267.