On the preparation of high reflectance aspherical mirrors by thin-film deposition

Optical and Quantum Electronics

Volumn 28, Issue 10, 1996, Pages 1583-1588

  Jaing, Cheng Chung ^a   Lee, Cheng Chung ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; DEPOSITION; DIELECTRIC FILMS; LIGHT REFLECTION; PRESSURE EFFECTS; SILICA; THIN FILMS; TITANIUM DIOXIDE; ZIRCONIA;

ASPHERICAL MIRRORS; OXYGEN PARTIAL PRESSURE;

MIRRORS;

EID: 0030259105     PISSN: 03068919     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF00326228     Document Type: Article

References (6)

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2. L. G. SCHULZ, J. Opt. Soc. Am. 37 (1947) 349.
3. J. A. DOBROWOLSKI and W. WEINSTEIN, Nature 175 (1955) 646.
4. W. WEINSTEIN and J. A. DOBROWOLSKI, in Astronomical Optics and Related Subjects, edited by Z. Kopal (North-Holland, Amsterdam, 1956) p. 360.
5. C. C. LEE, D. S. WAN, C. C. JAING and C. W. CHU, Appl. Opt. 32 (1993) 5535.
6. J. R. KURDOCK and R. R. AUSTIN, Phys. Thin Films 10 (1978) 261.