Trace moisture measurement in semiconductor gases

Sensors and Actuators, B: Chemical

Volumn 36, Issue 1-3, 1996, Pages 388-391

  Kijima, T ^a   Makihara, A ^b   Asa, H ^a   Ezell, E F ^c  

^a Osaka Sanso Kogyo Limited   (Japan)

^b Ichikawa Factory   (Japan)

^c BOC Group   (United States)

Author keywords

Cryogenic; Dew point; Direct method; Equilibrium; Moisture; Optical

Indexed keywords

CHEMICAL SENSORS; CRYOGENICS; GASES; PHASE EQUILIBRIA; PHASE TRANSITIONS; SEMICONDUCTOR MATERIALS; TRACE ANALYSIS; VAPOR PRESSURE;

DEW POINT METHOD; SEMICONDUCTOR GASES; TRACE MOISTURE MEASUREMENT;

MOISTURE;

EID: 0030257798     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(97)80102-5     Document Type: Article

References (6)

1. Humidity and Moisture, Vol. 1, Reinhold, New York, 1965.
2. T. Yajima, Frozen, 61 (1986) 618.
3. Industrial Measurement Hand Book, Asakura.
4. Japanese Industrial Standards (JIS), Z-8806.
5. Mizokami, Hitachi Toere Ltd., Technical Report, 3 (1990) 14.
6. Japanese Industrial Standards (JIS), K0226.