A silicon micromachined conductometric gas sensor with a maskless Pt sensing film deposited by selected-area CVD

Sensors and Actuators, B: Chemical

Volumn 36, Issue 1-3, 1996, Pages 312-319

  Majoo, Sanjeev ^a   Gland, J L ^a   Wise, K D ^b   Schwank, J W ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b University of Michigan   (United States)

Author keywords

Gas sensors; Microelectronic device; Platinum thin film; Selected area chemical vapor deposition

Indexed keywords

CARBON MONOXIDE; CHEMICAL VAPOR DEPOSITION; CONDUCTIVE FILMS; FILM GROWTH; HEAT RESISTANCE; HYDROGEN; MICROMACHINING; OXYGEN; PLATINUM; THIN FILMS;

SCANNING FORCE MICROSCOPY; SELECTED AREA CHEMICAL VAPOR DEPOSITION; SILICON PROCESSING;

CHEMICAL SENSORS;

EID: 0030257109     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(97)80088-3     Document Type: Article

References (8)

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