Linear planarization for CMP

Solid State Technology

Volumn 39, Issue 10, 1996, Pages

  Jairath, Rahul ^a   Pant, Anil ^a   Mallon, Tom ^a   Withers, Bradley ^a   Krusell, Wilbur ^a  

^a OnTrak Systems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL POLISHING; OXIDES; TUNGSTEN;

CHEMICAL MECHANICAL PLANARIZATION (CMP); WITHIN WAFER NONUNIFORMITY (WIWNU);

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0030251535     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (11)