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Volumn 32, Issue 5 PART 2, 1996, Pages 4672-4674
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Effects of Ni81Fe19 underlayer and Ar ion bombardment to deposition of (111) oriented Fe50Mn50 layers for Spin Valve devices
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Author keywords
[No Author keywords available]
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Indexed keywords
ANTIFERROMAGNETIC MATERIALS;
CRYSTAL GROWTH;
CRYSTAL ORIENTATION;
ION BEAMS;
ION BOMBARDMENT;
MAGNETIC FILMS;
MAGNETIC VARIABLES MEASUREMENT;
MAGNETORESISTANCE;
PROBES;
SPUTTER DEPOSITION;
VALVES (MECHANICAL);
X RAY CRYSTALLOGRAPHY;
ARGON IONS;
DC FOUR PROBE METHOD;
EXCHANGE BIAS FIELD;
IRON MANGANESE LAYERS;
NICKEL IRON UNDERLAYERS;
SPIN VALVE DEVICES;
VIBRATING SAMPLE MAGNETOMETER;
MULTILAYERS;
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EID: 0030247868
PISSN: 00189464
EISSN: None
Source Type: Journal
DOI: 10.1109/20.539114 Document Type: Article |
Times cited : (3)
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References (4)
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