In situ infrared studies of polyvinyl chloride films exposed to H2/O2/Ar downstream microwave plasmas

Journal of the Electrochemical Society

Volumn 143, Issue 9, 1996, Pages 2896-2905

  Zhao, Qiong ^a,c   Lu, Hsueh Yi ^a,d   Hess, Dennis W ^a,b  

^a Lehigh University   (United States)

^b ELECTROCHEMICAL SOCIETY

^c GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^d INTEGRATED DEVICE TECHNOLOGY INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; HYDROGEN; INFRARED SPECTROSCOPY; MORPHOLOGY; OXYGEN; PLASTIC FILMS; POLYVINYL CHLORIDES; PRESSURE EFFECTS; SURFACE PROPERTIES; SURFACE STRUCTURE;

CONTACT ANGLE MEASUREMENTS; INFRARED REFLECTION ABSORPTION SPECTROSCOPY; MICROWAVE PLASMAS; MOISTURE RESISTANCE; PLASMA REACTOR SYSTEM; PLASMA SURFACES INTERACTIONS; PRESSURE CHANGES; WETTABILITY;

PLASMA INTERACTIONS;

EID: 0030247841     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837124     Document Type: Article

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