An electrical model for the cathodically charged aluminum electrode

Journal of the Electrochemical Society

Volumn 143, Issue 9, 1996, Pages 2827-2834

  Wang, Mei Hui ^a,b   Hebert, Kurt R ^a,b  

^a Iowa State University of Science and Technology   (United States)

^b ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CATHODES; CONDUCTIVE FILMS; CURRENT DENSITY; ELECTRIC RESISTANCE; ELECTRODES; ETCHING; MATHEMATICAL MODELS; POLARIZATION; POROSITY; POROUS MATERIALS; SURFACES;

ANODIC PITTING; ANODIC POTENTIAL; CAPACITIVE PROCESS; CATHODIC CHARGING; CATHODIC POLARIZATION; ELECTRICAL MODEL; FARADAIC PROCESS; OXIDE FILMS; REACTION RATE; SURFACE FILMS;

METALLIC FILMS;

EID: 0030247283     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837114     Document Type: Article

References (31)

1. S. Real, M. Urquidi-Macdonald, and D. D. Macdonald, This Journal, 135, 1633 (1988).
2. C. K. Dyer and R. S. Alwitt, ibid., 128, 300 (1981).
3. G. E. Thompson and G. C. Wood, Corros. Sci., 18, 721 (1978).
4. H. Terryn, J. Vereecken, and G. E. Thompson, ibid., 32, 1159 (1991).
5. C.-F. Lin and K. R. Hebert, This Journal, 137, 3723 (1990).
6. H. Kaesche, Werkst. Korros., 14, 557 (1963).
7. D. Vermilyea, J. Appl. Phys., 27, 963 (1956).
8. J. Radosevic, M. Kliskic, P. Dabic, R. Stevanovic, and A. Despic, J. Electronanal. Chem., 277, 105 (1990).
9. C.-F. Lin, M. D. Porter, and K. R. Hebert, This Journal, 141, 96 (1994).
10. C.-F. Lin and K. R. Hebert, ibid., 141, 105 (1994).
11. G. E. Thompson and G. C. Wood, in Treatise on Materials Science and Technology, Vol. 23, J. C. Scully, Editor, p. 205, Academic Press, Inc., New York (1983).
12. C.-F. Lin, K. R. Hebert, and M. D. Porter, in Proceedings of the Symposium on Critical Factors in Localized Corrosion, G. S. Frankel and R. C. Newman, Editors, PV 92-9, p. 240, The Electrochemical Society Proceedings Series, Pennington, NJ (1992).
13. J. R. MacDonald, Impedance Spectroscopy: Emphasizing Solid Materials and Systems, Wiley, New York (1987).
14. J. Hitzig, K. Jüttner, W. J. Lorenz, and W. Paatsch, Corros. Sci., 24, 945 (1984).
15. K. J. Vetter and F. Gorn, Electrochim. Acta, 18, 321 (1973).
16. R. Kirchheim, ibid., 32, 1619 (1987).
17. J. Siejka, J. P. Nadai, and G. Amsel, This Journal, 118, 727 (1971).
18. M. Pourbaix, Atlas of Electrochemical Equilibria in Aqueous Solutions, p. 168, Pergamon Press, Oxford (1966).
19. T. Våland and K. E. Heusler, J. Electroanal. Chem., 149, 71 (1983).
20. CRC Handbook of Chemistry and Physics, 71st ed., D. R. Lide, Editor, p. 4-41, CRC Press, Boston (1990).
21. I. Rousar, K. Micka, and A. Kimla, Electrochemical Engineering II, p. 126, Elsevier, Amsterdam (1986).
22. R. De Levie, Electrochim. Acta, 10, 113 (1965).
23. B. A. Finlayson, Nonlinear Analysis in Chemical Engineering, McGraw-Hill, New York (1980).
24. A. W. Hassel and M. M. Lohrengel, Electrochim. Acta, 40, 433 (1995).
25. H. Takahashi, K. Kasahara, K. Fujiwara, and M. Seo, Corros. Sci., 36, 677 (1994).
26. H. Takahashi, K. Fujiwara, and M. Seo, ibid., 36, 689 (1994).
27. H. Yan and X. Hu, J. Appl. Phys., 73, 4324 (1993).
28. K. Shimizu, K. Kobayashi, G. E. Thompson, and G. C. Wood, Philos. Mag. A., 66, 643 (1992).
29. Y. G. Bérubé and P. L De Bruyn, J. Colloid Interface Sci., 28, 92 (1968).
30. G. E. Thompson and G. C. Wood, in Treatise on Materials Science and Technology, Vol. 23, J. C. Scully, Editor, p. 273, Academic Press, Inc., New York (1983).
31. D. J. Dzimitrowicz, J. B. Goodenough, and P. J. Wiseman, Mater. Res. Bull., 17, 971 (1982).