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Volumn 5, Issue 3, 1996, Pages 180-186

Fabrication of a silicon-based superfluid oscillator

Author keywords

[No Author keywords available]

Indexed keywords

ACOUSTIC NOISE; ELECTRON BEAM LITHOGRAPHY; MICROMACHINING; PERFORMANCE; SEMICONDUCTING SILICON; SUPERFLUID HELIUM;

EID: 0030246792     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.536624     Document Type: Article
Times cited : (8)

References (16)
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  • 6
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  • 7
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  • 8
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    • Sept.
    • R. M. Finne and D. K. Klein, "A water-amine-complexing agent system for etching silicon," J. Electrochem. Soc., vol. 114, no. 9, pp. 965-970, Sept. 1967.
    • (1967) J. Electrochem. Soc. , vol.114 , Issue.9 , pp. 965-970
    • Finne, R.M.1    Klein, D.K.2
  • 9
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    • The controlled etching of silicon in catalyzed ethylenediamine-pyrocatechol-water solution
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  • 11
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.