The effect of microstructure and interface conditions on the anisotropie exchange fields of NiO/NiFe

IEEE Transactions on Magnetics

Volumn 32, Issue 5 PART 1, 1996, Pages 3419-3421

  Lai, Chih Huang ^a   Anthony, Thomas C ^a   Iwamura, Eiji ^a   Robert, L ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; GRAIN SIZE AND SHAPE; INTERFACES (MATERIALS); MAGNETIC FIELD EFFECTS; MAGNETRON SPUTTERING; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROSTRUCTURE; NICKEL ALLOYS; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY;

ANISOTROPIC EXCHANGE FIELDS; NICKEL IRON ALLOYS; NICKEL OXIDE; REACTIVE SPUTTERING;

MULTILAYERS;

EID: 0030246132     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.538643     Document Type: Article

References (7)

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2. C.H. Lai, H.Matsuyama, R.L. White and T.C. Anthony, " Anisotropie exchange for NiFe films grown on epitaxial NiO," IEEE Trans. Magn., vol. 031,pp. 2609-2611, November 1995.
3. C.H. Lai, H.Matsuyama, R.L. White, T.C. Anthony and G.G.Bush, "Exploration of magnetization reversal and coercivity of epitaxial NiO( 0111 I /NiFe," MMM95 (HA-06).
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7. T.J.Moran.J.M.Gallego and I.K.Schuller/'Increased exchange anisotropy due to disorder at permalloy/CoO interfaces".!.Appl.Hhys.,78,pp. 1887-1891 August, 1995