Investigation of the interfacial region formed during ZnO growth on Si(100) substrate using single-source CVD

Surface and Interface Analysis

Volumn 24, Issue 9, 1996, Pages 675-678

  Koch, M H ^a   Mar, G L ^a   Hartmann, A J ^a   Lamb, R N ^a  

^a UNIVERSITY OF NEW SOUTH WALES   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

IN SITU SURFACE ANALYTICAL METHODS; INTERFACIAL REGION;

ADHESION; AUGER ELECTRON SPECTROSCOPY; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; COMPOSITION; INTERFACES (MATERIALS); OXIDATION; SILICON WAFERS; SUBSTRATES; SURFACE STRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

FILM GROWTH;

EID: 0030246015     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(19960916)24:9<675::AID-SIA166>3.0.CO;2-Z     Document Type: Article

References (16)