Angle-dependent XPS analysis of (NH4)2Sx-treated InP(001) surfaces

Surface and Interface Analysis

Volumn 24, Issue 9, 1996, Pages 578-582

  Fukuda, Y ^a   Suzuki, Y ^a   Sanada, N ^a   Sasaki, S ^b  

^a SHIZUOKA UNIVERSITY   (Japan)

^b SEIKO INSTRUMENTS INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIUM COMPOUNDS; ANNEALING; ELECTRON ENERGY LEVELS; MONOLAYERS; SEMICONDUCTING INDIUM PHOSPHIDE; SPECTROSCOPIC ANALYSIS; SULFUR; SURFACE TREATMENT; SURFACES; VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

AMMONIUM SULFITE; CHEMICAL STATES; ROOM TEMPERATURE;

SURFACE STRUCTURE;

EID: 0030246014     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(19960916)24:9<578::AID-SIA157>3.0.CO;2-R     Document Type: Article

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