Spectrochemical analysis of trace contaminants in helium (helium-fluorine) pulsed discharge plasmas

Journal of Analytical Atomic Spectrometry

Volumn 11, Issue 9, 1996, Pages 649-659

  Treshchalov, Aleksei B ^a   Chizhik, Andrei S ^a   Vill, Arnold A ^a  

^a INSTITUTE OF PHYSICS   (Estonia)

Author keywords

Discharge; Fluorine laser; Gas mixture degradation; Plasmo chemical reactions; Radicals; Vacuum ultraviolet visible emission absorption spectroscopy

Indexed keywords

ABSORPTION SPECTROSCOPY; CHEMICAL REACTIONS; ELECTRIC DISCHARGES; ELECTRON ENERGY LEVELS; EMISSION SPECTROSCOPY; FLUORINE; HELIUM; IMPURITIES; REACTION KINETICS;

FLUORINE LASERS; GAS MIXTURE DEGRADATION; PLASMO CHEMICAL REACTIONS; PULSED DISCHARGE PLASMAS; SPECTROCHEMICAL ANALYSIS; TRACE CONTAMINANTS; VACUUM ULTRAVIOLET VISIBLE EMISSION ABSORPTION SPECTROSCOPY;

PLASMAS;

EID: 0030245518     PISSN: 02679477     EISSN: None     Source Type: Journal    
DOI: 10.1039/JA9961100649     Document Type: Article

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