NiO Exchange Bias Layers Grown by Direct Ion Beam Sputtering of a Nickel Oxide Target

IEEE Transactions on Magnetics

Volumn 32, Issue 5 PART 2, 1996, Pages 4651-4653

  Michel, Richard P ^a   Chaiken, Alison ^a   Kim, Young K ^b   Johnson, Lantz E ^a  

^a LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^b Quantum Peripherals Colorado Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; INTERFACES (MATERIALS); ION BEAMS; MAGNETIC FIELD EFFECTS; MAGNETIC FILMS; MAGNETIZATION; MAGNETRON SPUTTERING; NICKEL COMPOUNDS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; THERMAL EFFECTS; X RAY DIFFRACTION;

DIRECT ION BEAM SPUTTERING; EXCHANGE BIAS LAYERS; EXCHANGE COUPLING; EXCHANGE FIELD; NICKEL OXIDE; REACTIVE MAGNETRON SPUTTERING;

ANTIFERROMAGNETIC MATERIALS;

EID: 0030245457     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.539107     Document Type: Article

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