Hydrogen adsorption induced surface reconstructions on Si(113) studied by LEED

Applied Surface Science

Volumn 103, Issue 1, 1996, Pages 101-105

  Hu, Xiaoming ^a   Feng, Kean ^a   Lin, Zhangda ^a   Xing, Yirong ^b  

^a INSTITUTE OF PHYSICS   (China)

^b INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPOSITION EFFECTS; GAS ADSORPTION; HYDROGEN; LOW ENERGY ELECTRON DIFFRACTION; PHASE COMPOSITION; SURFACE STRUCTURE; THERMAL EFFECTS;

SURFACE RECONSTRUCTION;

SEMICONDUCTING SILICON;

EID: 0030245109     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(96)00563-6     Document Type: Article

References (13)

1. J.M. Gibson, M.L. McDonald and F.C. Unterwald, Phys. Rev. Lett. 55 (1985) 1765.
2. W. Ranke and Y.R. Xing, Phys. Rev. B 31 (1985) 2246.
3. U. Myler and K. Jacobi, Surf. Sci. 220 (1989) 353.
4. Y.R. Xing, J.P. Zhang, J.A. Wu, C.Z. Liu and C.H. Wang, Surf. Sci. 232 (1990) L215.
5. M.J. Hadley, S.P. Tear, B. Rottger and H. Neddermeyer, Surf. Sci. 280 (1993) 258.
6. W. Ranke, Phys. Rev. B 41 (1990) 5243.
7. H. Huang, S.Y. Tong, U. Myler and K. Jacobi, Surf. Rev. Lett. 1 (1994) 221.
8. U. Myler, P. Althainz and K. Jacobi, Surf. Sci. 251 (1991) 607.
9. K. Jacobi and U. Myler, Surf. Sci. 284 (1993) 223.
10. X. Hu and Z. Lin, Phys. Rev. B 51 (1995) 10164.
11. J. Knall, J.B. Pethica, J.D. Todd and J.H. Wilson, Phys. Rev. Lett. 66 (1991) 1733.
12. M. Shi, Y. Wang and J.W. Rabalais, Phys. Rev. B 48 (1993) 1689.
13. X. Hu and Z. Lin, Appl. Surf. Sci. 90 (1995) 111.