High coercivity SmFeSiC films fabricated by multilayer sputtering

IEEE Transactions on Magnetics

Volumn 32, Issue 5 PART 2, 1996, Pages 4550-4552

  Zhang, S Y ^a   Shan, Z S ^a   Liu, Y ^a   Sellmyer, D J ^a   Zhao, T Y ^b   Zhao, J G ^b   Shen, B G ^b  

^a UNIVERSITY OF NEBRASKA LINCOLN   (United States)

^b INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COERCIVE FORCE; FILM PREPARATION; HEAT TREATMENT; MAGNETIC VARIABLES MEASUREMENT; MAGNETOMETERS; MULTILAYERS; PRESSURE EFFECTS; SAMARIUM COMPOUNDS; SILICON; SPUTTERING; SUBSTRATES;

ARGON PRESSURE; MULTILAYER SPUTTERING; SQUARENESS; THICKNESS;

MAGNETIC THIN FILMS;

EID: 0030245108     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.539077     Document Type: Article

References (11)

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