A fully integrated micromachined magnetic particle separator

Journal of Microelectromechanical Systems

Volumn 5, Issue 3, 1996, Pages 151-158

  Ahn, Chong H ^a,b,g,h,i,j   Allen, Mark G ^a,c,k,l   Trimmer, William ^{a,d,m,n,o,p,q,r,s}   Jun, Yong Nam ^e,s,t   Erramilli, Shyamsunder ^e,f,u,v  

^a IEEE

^b University of Cincinnati   (United States)

^c GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^d Belle Mead Research   (United States)

^e PRINCETON UNIVERSITY   (United States)

^f Boston University   (United States)

^g Inha University   (South Korea)

^h Seoul National University   (South Korea)

ⁱ GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^j IBM T J WATSON RESEARCH CENTER   (United States)

^k UNIVERSITY OF PENNSYLVANIA   (United States)

^l MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^m OCCIDENTAL COLLEGE   (United States)

ⁿ WESLEYAN UNIVERSITY   (United States)

^o MONTCLAIR STATE UNIVERSITY   (United States)

^p 931 College Mall   (United States)

^q Singer's Corporate Laboratory

^r LUCENT TECHNOLOGIES   (United States)

^s AT and T Bell Laboratories ^*

^t CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

^u UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^v BOSTON UNIVERSITY   (United States)

more..

Author keywords

[No Author keywords available]

Indexed keywords

ELEMENTARY PARTICLES; MAGNETIC FIELDS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; PERMANENT MAGNETS; PROCESS CONTROL; SILICON WAFERS; SOLUTIONS;

MAGNETIC FIELD GRADIENTS; MAGNETIC PARTICLE SEPARATOR; SUSPENDED LIQUID SOLUTIONS;

PARTICLE SEPARATORS;

EID: 0030245099     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/84.536621     Document Type: Article

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