Thermal nitridation of SiO2 films in ammonia: Isotopic tracing of nitrogen and oxygen in further stages and in reoxidation

Journal of the Electrochemical Society

Volumn 143, Issue 9, 1996, Pages 2946-2952

  Baumvol, I J R ^a   Stedile, F C ^a   Ganem, J J ^b   Trimaille, I ^b   Rigo, S ^b,c  

^a FEDERAL UNIVERSITY OF RIO GRANDE DO SUL   (Brazil)

^b CNRS   (France)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; ATOMS; CHEMICAL REACTIONS; INTERFACES (MATERIALS); NITROGEN; OXIDATION; OXYGEN; SEMICONDUCTING FILMS; SILICA;

INTERSTITIAL DIFFUSION; ISOTOPIC TRACING; NUCLEAR REACTION ANALYSES; OXYNITRIDE FILMS; REOXIDATION; THERMAL NITRIDATION;

DIFFUSION IN SOLIDS;

EID: 0030244858     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837131     Document Type: Article

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