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Volumn 24, Issue 10, 1996, Pages 729-730
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On the XPS analysis of Si-OH groups at the surface of silica
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Author keywords
[No Author keywords available]
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Indexed keywords
AUGER ELECTRON SPECTROSCOPY;
BINDING ENERGY;
BONDING;
CALIBRATION;
COATINGS;
OXIDES;
SILICA;
SILICON;
STANDARDS;
STOICHIOMETRY;
SURFACES;
X RAY PHOTOELECTRON SPECTROSCOPY;
CHEMICAL SHIFT;
ELECTRON ATTENUATION LENGTHS;
HYDROXIDES;
SPECTROSCOPIC ANALYSIS;
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EID: 0030244649
PISSN: 01422421
EISSN: None
Source Type: Journal
DOI: 10.1002/(SICI)1096-9918(19960930)24:10<729::AID-SIA183>3.0.CO;2-P Document Type: Article |
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Times cited : (49)
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References (5)
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