X-ray photoelectron spectroscopy study of optical waveguide glasses

Surface and Interface Analysis

Volumn 24, Issue 9, 1996, Pages 605-610

  Kibel, Martyn H ^a   Leech, Patrick W ^a  

^a TELSTRA RESEARCH LABORATORIES   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER PARAMETER; CHEMICAL SHIFT CHANGES; DOPANT; FLAME HYDROLYSIS DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION;

CHEMICAL VAPOR DEPOSITION; COMPOSITION; DOPING (ADDITIVES); FUSED SILICA; GERMANIUM; OPTICAL GLASS; OPTICAL WAVEGUIDES; REACTIVE ION ETCHING; STOICHIOMETRY; SULFUR COMPOUNDS; SURFACE STRUCTURE; SURFACE TREATMENT;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0030244613     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(19960916)24:9<605::AID-SIA161>3.0.CO;2-K     Document Type: Article

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