Chemically amplified deep-ultraviolet photoresist

Advanced Materials and Processes

Volumn 150, Issue 3, 1996, Pages 41-42

  Reichmanis, Elsa ^a   Blakeney, Andrew ^a  

^a NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMAGE QUALITY; INTEGRATED CIRCUIT MANUFACTURE; LIGHT ABSORPTION; LIGHT AMPLIFIERS; LITHOGRAPHY; PHOTOSENSITIVITY; ULTRAVIOLET DEVICES; VLSI CIRCUITS;

CHEMICALLY AMPLIFIED (CAMP) DEEP ULTRAVIOLET PHOTORESIST;

PHOTORESISTS;

EID: 0030244549     PISSN: 08827958     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (0)