Optimization of electrothermal vaporization, inductively coupled plasma mass spectrometry conditions for the determination of iron, copper, nickel and zinc in semiconductor grade acids

Spectrochimica Acta - Part B Atomic Spectroscopy

Volumn 51, Issue 11, 1996, Pages 1393-1401

  Laly, S ^a   Nakagawa, K ^a   Arimura, T ^a   Kimijima, T ^a  

^a Nippon Sanso Tsukuba Laboratory   (Japan)

Author keywords

Fe, Ni, Cu, Zu; Graphite furnace; Inductively coupled plasma mass spectrometry; Semiconductor grade acids; Vaporization temperature

Indexed keywords

ACIDS; COPPER; FURNACES; IRON; NICKEL; PLASMA DIAGNOSTICS; SEMICONDUCTOR MATERIALS; VAPORIZATION; ZINC;

ELECTROTHERMAL VAPORIZATION; GRAPHITE FURNACE; INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY; SEMICONDUCTOR GRADE ACIDS;

MASS SPECTROMETRY;

EID: 0030244350     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/0584-8547(96)01492-9     Document Type: Article

References (36)

1. K.E. Jarvis, A.L. Gray and R.S. Houk, Handbook of Inductivlely Coupled Plasma Mass Spectrometry, Blackie, Glasgow, 1992, p. 82.
2. G.M. Hieftje and L.A. Norman, Int. J. Mass Spectrom. Ion Processes, 118/119 (1992) 519.
3. R.S. Houk and J.J. Thomson, Mass Spectrom. Rev., 7 (1988) 425.
4. M.A. Marabini, B. Passariello and M. Barbaro, Microchem. J., 46 (1992) 302.
5. D.S. Lowe and R.G. Stahl, Anal. Proc., 29 (1992) 277.
6. M.E. Ketterer and D.A. Biddle, Anal. Chem., 64 (1992) 1619.
7. V. Karanassois and G. Horlik, Spectrochim. Acta Rev., 13(2) (1990) 89.
8. A. Stroh and U. Volkopf, Anal. Proc., 29 (1992) 274.
9. J. Fucsko, S.S. Tan and M.K. Balazs, J. Electrochem. Soc., 140(4) (1993) 1105.
10. S.E. Jackson, H.P. Longerich, G.R. Dunning and B.J. Fryer, Can. Mineral., 30 (1992) 1049.
11. R. Robert, Anal. Proc., 29 (1992) 286.
12. H. Baumann, Fresenius' J. Anal. Chem., 342 (1992) 907.
13. N. Shibata, N. Futagawa and M. Kubota, Spectrochim. Acta Part B, 48(9) (1993) 1127.
14. T.K. Starn and G.M. Hieftje, Appl. Spectrosc., 46(10) (1992) 1454.
15. D.C. Gregoire, Anal. Proc., 29 (1992) 276.
16. D. Beauchemin, K.W.M. Siu, J.W. McLaren and S.S. Berman, J. Anal. At. Spectrom., 4 (1989) 285.
17. J.W. McLaren, K.W.M. Siu and J.W. Lam, Fresenius' J. Anal. Chem., 337 (1990) 721.
18. V.A. Fassel and B.R. Bear, Spectrochim. Acta Part B, 41 (1986) 1089.
19. B.F. Phillips, D.C. Burkman, W.R. Schmidt and C.A. Peterson, J. Vac. Sci. Technol. A,1 (1983) 646.
20. T.J. Schaffner, Surf. Interface Anal., 14 (1989) 598.
21. M. Grasserbauer and G. Stingeder, Fresenius' Z. Anal. Chem., 337 (1990) 701.
22. J.M. Ren and E.D. Salin, J. Anal. At. Spectrom., 8 (1993) 59.
23. S. Laly, K. Nakagawa and T. Kimijima, Fresenius' J. of Anal. Chem., in press.
24. A.L. Gray and A.R. Date, Analyst, 108 (1983) 1033.
25. P.G. Whittaker, T. Lind, J.G. Williams and A.L. Gray, Analyst, 114 (1989) 675.
26. C.J. Park and G.E.M. Hall, J. Anal. At. Spectrom. 2 (1987) 473.
27. R. Tsukahara and M. Kubota, Spectrochim. Acta Part B, 45 (1990) 779.
28. R.C. Hutton and A.N. Eaton, J. Anal. At. Spectrom., 2 (1987) 595.
29. A. Ulrich, W. Wannecker, S. Meiners and U. Vollkopf, Anal. Proc., 29 (1992) 284.
30. P. Verrept, G. Galbaes, L. Moens, R. Dams and U. Kurfurst, Spectrochim. Acta Part B, 48(5) (1993) 671.
31. T. Kantor, Spectrochim. Acta Part B, (1988) 1299.
32. R.D. Ediger and S.A. Beres, Appl. Spectrosc., 47 (1992) 907.
33. D.C. Gregorie, S. Al-Maewali and C.L. Chakrabatri, Spectrochim. Acta Part B, 47 (1992) 1123.
34. F. Janos, ST. Samantha and K.B. Marjorie, J. Electrochem. Soc., 140(4) (1993) 1105.
35. P.A. Taylor, J. Crystal Growth, 89 (1988) 28.
36. A. Corradi, M. Domenici and A. Guaglio, J. Crystal Growth, 89 (1989) 39.