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IEEE Transactions on Electron Devices
Volumn 43, Issue 9, 1996, Pages 1547-1552
Surface micromachined piezoresistive pressure sensors with step-type bent and flat membrane structures
Author keywords

[No Author keywords available]
Indexed keywords

ETCHING; MICROMACHINING; MINIATURE INSTRUMENTS; PIEZOELECTRIC DEVICES; PIEZOELECTRIC MATERIALS; PRESSURE EFFECTS; PRESSURE TRANSDUCERS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE STRUCTURE;
EID: 0030244098     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.535348     Document Type: Article
Times cited : (18)
References (9)
  • 1
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    • Sens. Actuators, Vol. a
    • Guckel, H.1
  • 2
    • 21144480174 scopus 로고    scopus 로고
    • "Surface micromachined microdiaphragm pressure sensors,"
    • vol. 4, no. 5, pp. 265-275, 1993.
    • S. Sugiyama, K. Shimaoka, and O. Tabata, "Surface micromachined microdiaphragm pressure sensors," Sens Materials, vol. 4, no. 5, pp. 265-275, 1993.
    • Sens Materials
    • Sugiyama, S.1    Shimaoka, K.2    Tabata, O.3
  • 3
    • 33747225889 scopus 로고    scopus 로고
    • "Microdiaphragm pressure sensor using polysilicon sacrificial layer etch stop technique,"
    • 93, pp. 632-635.
    • K. Shimaoka, O. Tabata, M. Kimura, and S. Sugiyama, "Microdiaphragm pressure sensor using polysilicon sacrificial layer etch stop technique," Proc. Transducers'93, pp. 632-635.
    • Proc. Transducers'
    • Shimaoka, K.1    Tabata, O.2    Kimura, M.3    Sugiyama, S.4
  • 4
    • 0028545274 scopus 로고    scopus 로고
    • "A small-size silicon microphone for measurements in turbulent gas flows,"
    • 45, pp. 103-108, 1994.
    • E. Kälvesten, L. Löfdahl, and G. Stemme, "A small-size silicon microphone for measurements in turbulent gas flows," Sens. Actuators, vol. A45, pp. 103-108, 1994.
    • Sens. Actuators, Vol. a
    • Kälvesten, E.1    Löfdahl, L.2    Stemme, G.3
  • 5
    • 0010264850 scopus 로고    scopus 로고
    • "Surface micromachined piezoresistive pressure sensor,"
    • 95, pp. 21-25, ACS Organizations GmbH, 9.-11. May 1995, Nürnberg, Germany.
    • [5J T. Lisec, H. Stauch, and B. Wagner, "Surface micromachined piezoresistive pressure sensor," Proc. Sensor '95, pp. 21-25, ACS Organizations GmbH, 9.-11. May 1995, Nürnberg, Germany.
    • Proc. Sensor '
    • Lisec, J.T.1    Stauch, H.2    Wagner, B.3
  • 6
    • 0029419198 scopus 로고    scopus 로고
    • "A combined TMAH and HF sacrificial layer etching technique for surface micromachined devices,"
    • 95, 1995, vol. 2639, pp. 286-293.
    • T. Lisec, M. Kreutzer, B. Wenk, and B. Wagner, "A combined TMAH and HF sacrificial layer etching technique for surface micromachined devices," Proc. SPIE'95, 1995, vol. 2639, pp. 286-293.
    • Proc. SPIE'
    • Lisec, T.1    Kreutzer, M.2    Wenk, B.3    Wagner, B.4
  • 7
    • 0029288648 scopus 로고    scopus 로고
    • "Deposition of thick doped polysilicon films with low stress in an epitaxial reactor for surface micrumachining applications,"
    • vol. 259, pp. 181-187, 1995.
    • J M. Kirsten, B. Wenk, F. Ericson, J. A. Sehweite, W. Riethmüller, and P. Lange, "Deposition of thick doped polysilicon films with low stress in an epitaxial reactor for surface micrumachining applications," Thin Solid Films, vol. 259, pp. 181-187, 1995.
    • Thin Solid Films
    • Kirsten, J.M.1    Wenk, B.2    Ericson, F.3    Sehweite, J.A.4    Riethmüller, W.5    Lange, P.6

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.