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Volumn 365, Issue 1, 1996, Pages 177-185

Characterization of surface morphology in epitaxial growth

Author keywords

Computer simulations; Growth; Iron; Low energy electron diffraction (LEED); Morphology; Reflection high energy electron diffraction (RHEED); Roughness and topography; Single crystal surfaces; Surface roughening; Surface structure

Indexed keywords

CALCULATIONS; CHARACTERIZATION; COMPUTER SIMULATION; IRON; LOW ENERGY ELECTRON DIFFRACTION; MORPHOLOGY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; SINGLE CRYSTALS; SURFACE ROUGHNESS; SURFACES;

EID: 0030244005     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(96)00692-9     Document Type: Article
Times cited : (20)

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    • note
    • In the simulations presented here, a small amount of "transient kinetics" (according to which freshly deposited atoms at a step edge may hop immediately to the nearest fourfold hollow site below) was included. This is equivalent to the "knockout" process at step edges observed in field-ion microscopy of Rh deposited on Ir/Ir(111) clusters [14].
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    • note
    • ∥, due to the use of periodic boundary conditions and the epitaxial constraint that the heights of neighboring sites must differ by 1.
  • 31
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    • note
    • ∥.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.