Fluorescence of Ta2O5 thin films doped by kilo-electron-volt Er implantation: Application to microcavities

Applied Optics

Volumn 35, Issue 25, 1996, Pages 5005-5012

  Rigneault, H ^a   Flory, F ^a   Monneret, S ^a   Robert, S ^a   Roux, L ^b  

^a CNRS   (France)

^b Ion Beam Service   (France)

Author keywords

Er ion; Ion implantation; Microcavities; Spontaneous emission; Thin films

Indexed keywords

ANNEALING; CAVITY RESONATORS; ERBIUM; FLUORESCENCE; INFRARED SPECTROSCOPY; ION IMPLANTATION; LIGHT ABSORPTION; LIGHT EXTINCTION; OPTICAL PUMPING; REFRACTIVE INDEX; SECONDARY ION MASS SPECTROMETRY; TANTALUM COMPOUNDS;

EXTINCTION COEFFICIENT; ION PLATING; MICROCAVITIES; OPTICAL LOSSES; PHOTOTHERMAL DEFLECTION TECHNIQUE; SPONTANEOUS EMISSION; TANTALUM OXIDE;

THIN FILMS;

EID: 0030242673     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.35.005005     Document Type: Article

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