E-beam lithography: The debate continues

Semiconductor International

Volumn 19, Issue 10, 1996, Pages 85-92

  DeJule, Ruth ^a  

^a NONE

Author keywords

Direct write; Mask making; Photolithography

Indexed keywords

MASKS; PHOTOLITHOGRAPHY; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE;

CRITICAL DIMENSION; DIRECT WRITE MANUFACTURING; MASK MAKING;

ELECTRON BEAM LITHOGRAPHY;

EID: 0030242536     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Short Survey

References (5)

1. S. Berger et al., SPIE Proceedings, vol. 2322, p. 434, 1994.
2. T.H.P. Chang et al., J. Vac. Sci. Technol. B, Vol. 8, p. 1698, 1990.
3. T.H.P. Chang et al., EIP Beam and Nanofabrication Proceedings, Atlanta, Ga., May 1996.
4. S.C. Minne et al., Appl. Phys. Lett., vol. 67, p. 3918, 1995.
5. T. Kiuchi et al., EIP Beam and Nanofabrication Proceedings, Atlanta, Ga., May 1996.