Effect of backbone structures of polysilanes on the photooxidation reaction

Polymer

Volumn 37, Issue 19, 1996, Pages 4327-4331

  Kabeta, Keiji ^a   Shuto, Kiyoaki ^a   Sugi, Shin Ichiro ^a   Imai, Takafumi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Photooxidation; Polysilane; Structure

Indexed keywords

DEGRADATION; INFRARED SPECTROSCOPY; INTERPENETRATING POLYMER NETWORKS; LIGHT ABSORPTION; MOLECULAR STRUCTURE; MOLECULAR WEIGHT; OXIDATION; PHOTOCHEMICAL REACTIONS; SIZE EXCLUSION CHROMATOGRAPHY; ULTRAVIOLET SPECTROSCOPY;

BACKBONE STRUCTURE; PHOTOOXIDATION REACTION; POLYCYCLOHEXYLMETHYLSILYLENE; POLYCYCLOHEXYLMETHYLSILYLENE COHEXYLSILYNE; POLYCYCLOHEXYLMETHYLSILYLENE COPHENYLSILYNE; POLYHEXYLSILYNE; POLYMETHYLPHENYLSILYLENE;

POLYSILANES;

EID: 0030241585     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/0032-3861(96)00276-5     Document Type: Article

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