Chemical behavior in diffusion bonding of Si3N4-Ni and Si3N4-superalloy IN-738

Scripta Materialia

Volumn 35, Issue 6, 1996, Pages 675-681

  Chen, Y C ^a   Iwamoto, C ^a   Ishida, Y ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BONDING; CALCULATIONS; CRYSTAL ATOMIC STRUCTURE; DIFFUSION; HEAT TREATMENT; INTERFACES (MATERIALS); METALLOGRAPHIC MICROSTRUCTURE; NICKEL ALLOYS; PHASE COMPOSITION; SILICON NITRIDE; THERMODYNAMICS; TRANSMISSION ELECTRON MICROSCOPY;

NICKEL SUPERALLOY IN 738; SOLID STATE DIFFUSION BONDING; STANDARD FORMATION ENERGY;

SUPERALLOYS;

EID: 0030241549     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/1359-6462(96)00161-3     Document Type: Article

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