Fundamentals and application of an expanding hydrogen low-pressure plasma jet

Vacuum

Volumn 47, Issue 9, 1996, Pages 1123-1127

  Otorbaev, D K ^a,b   Brussaard, G J H ^a   Qing, Zhou ^a   Van De Sanden, M C M ^a   Schram, D C ^a  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b Kyrgyz National Academy of Sciences   (Kyrgyzstan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; DENSITY OF GASES; DISSOCIATION; HYDROGEN; MAGNETIC FIELD EFFECTS; MOLECULES;

EXITED STATES;

PLASMA JETS;

EID: 0030241156     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0042-207X(96)00140-6     Document Type: Article

References (22)

1. P K Bachmann, A T Collins and M Seal M Diamond 1992 Proc III Int Conference on the New Diamond Science and Technology. Elsevier, Amsterdam (1992).
2. D L Smith, Thin Films Deposition. McGraw-Hill Inc., New York (1995).
3. M J Thompson, Y Hamakawa and P G LeComber (Eds) Amorphous Silicon Technology, Materials Research Society Symposium Proceedings, Vol. 258. MRS, Pittsburgh (1992).
4. J G Alessi and A Hershcovitch (Eds) Production and Neutralization of Negative Ions and Beams AIP Conference Proceedings, No. 387. AIP, New York (1994).
5. G M W Kroesen, C J Timmermans and D C Schram Pure and Appl Chem, 88, 795 (1988).
6. Zhou Qing, M J de Graaf, M C M van de Sanden, D K Otorbaev and D C Schram, Rev Sci Instrum, 65, 1469 (1994).
7. A T M Wilbers, G J Meeusen, M Haverlag, GMW Kroesen and D C Schram, Thin Solid Films, 204, 59 (1992).
8. A J M Buuron, G J Meeusen, J J Beulens, MCM van de Sanden and D C Schram, J Nucl Mat, 200, 430 (1993).
9. M C M van de Sanden, G M Janssen, J M de Regt, D C Schram, J A M van der Mullen, B van der Sijde, Rev Sci Instrum, 63, 3369 (1992).
10. M J de Graaf, R J Severens, R P Dahiya, M C M van de Sanden and D C Schram, Phys Rev E, 48, 2098 (1993).
11. A C G Mitchell and M W Zemansky, Resonance Radiation and Excited Atoms. Cambridge University Press, Cambridge (1971).
12. D K Otorbaev, M C M van de Sanden, A J M Buuron and D C Schram, Plasma Sources Sci Technol, 4, 142 (1995).
13. M C M van de Sanden, Zhou Qing, D K Otorbaev, M J de Graaf, J C A Wevers and D C Schram, Proc V European Workshop on Production and Application of Light Negative Ions, Dublin, Ireland, 41 (1994).
14. D K Otorbaev, M C M van de Sanden and D C Schram, Plasma Sources Sci Technol, 4, 293 (1995).
15. M J J Eerden, M C M van de Sanden, D K Otorbaev and D C Schram, Phys Rev A, 51, 3362 (1995).
16. A Garscadden and R Nagpal, Plasma Sources Sci Technol, 4, 268 (1995).
17. H W Drawin and F Emard, Beitr Plasmaphysik, 13, 143 (1973).
18. V M Lelevkin, D K Otorbaev and D C Schram, Physics of Non-Equilibrium Plasmas. Elsevier, Amsterdam (1992).
19. H P Huber and G Herzberg, Molecular Spectra and Molecular Structure. IV. Constants of Diatomic Molecules. Van Nostrand, New York (1972).
20. D K Otorbaev, V N Ochkin, N G Preobrazhensky, S Yu Savinov, A I Sedelnikov and N N Sobolev, Sov Phys JETP, 81, 1626 (1981).
21. D W Setser, D H Stedman and J A Coxon, J Chem Phys, 53, 1004 (1970).
22. B M Smirnov, Negative Ions. McGraw-Hill, London (1982).