Effects of growth interruption and FIB implantation in the UHV total vacuum process for the buried mesoscopic structures

Physica B: Condensed Matter

Volumn 227, Issue 1-4, 1996, Pages 268-270

  Wakaya, F ^a   Matsubara, T ^a   Nakayama, H ^a   Yanagisawa, J ^a   Yuba, Y ^a   Takaoka, S ^a   Murase, K ^a   Gamo, K ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Focused ion beam; Growth interruption; In situ process; Molecular beam epitaxy

Indexed keywords

CALCULATIONS; EXPERIMENTS; HETEROJUNCTIONS; ION BEAMS; VACUUM APPLICATIONS;

FOCUSED ION BEAM; GROWTH INTERRUPTION; IN-SITU PROCESS;

ELECTRON WAVE TUBES;

EID: 0030235741     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/0921-4526(96)00417-6     Document Type: Article

References (3)

1. F. Wakaya, Y. Yuba, S. Takaoka, K. Murase and K. Gamo, Jpn. J. Appl. Phys. 32 (1993) 6242.
2. F. Wakaya, A. Nozawa, J. Yanagisawa, Y. Yuba, S. Takaoka, K. Murase and K. Gamo, Microelectric Engineering 23 (1994) 123.
3. L. He, H. Hasegawa, T. Sawada and H. Ohno, J. Appl. Phys. 63 (1988) 2120.