Low temperature deposition of (Ba, Sr)TiO3 films by electron cyclotron resonance plasma chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 9 SUPPL. B, 1996, Pages 5089-5093

  Sone, Shuji ^a   Yabuta, Hisato ^a   Kato, Yoshitake ^a   Iizuka, Toshihiro ^a   Yamamichi, Shintaro ^a   Yamaguchi, Hiromu ^a   Lesaicherre, Pierre Yves ^a   Nishimoto, Shozo ^a   Yoshida, Masaji ^a  

^a NEC CORPORATION   (Japan)

Author keywords

(Ba, Sr)TiO3; DRAM; ECR plasma CVD; Low temperature deposition; Thin film capacitor

Indexed keywords

LOW TEMPERATURE DEPOSITION; THIN FILM CAPACITOR;

CAPACITORS; CHEMICAL VAPOR DEPOSITION; ELECTRON CYCLOTRON RESONANCE; EXPERIMENTS; LOW TEMPERATURE OPERATIONS; PLASMA APPLICATIONS;

METALLIC FILMS;

EID: 0030235585     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.5089     Document Type: Article

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