|
Volumn 6, Issue 5, 1996, Pages
|
Field emission from As-grown and ion-beam-sharpened diamond particles deposited on silicon tips
b b b b a a |
Author keywords
[No Author keywords available]
|
Indexed keywords
CHEMICAL VAPOR DEPOSITION;
CURRENT VOLTAGE CHARACTERISTICS;
ELECTRIC CURRENTS;
ELECTRIC FIELDS;
ELECTRON EMISSION;
ELECTRONS;
ION BEAMS;
ION BOMBARDMENT;
IONS;
MILLING (MACHINING);
SILICON;
FIELD EMISSION;
ION BEAM BOMBARDMENT;
ION BEAM EFFECTS;
ION MILLING;
NEGATIVE ELECTRON AFFINITY;
SHARPENING;
DIAMOND FILMS;
|
EID: 0030235503
PISSN: 11554339
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1051/jp4:1996516 Document Type: Article |
Times cited : (3)
|
References (13)
|