Peculiarities of the field emission with porous Si surfaces, covered by ultrathin DLC films

Journal De Physique. IV : JP

Volumn 6, Issue 5, 1996, Pages

  Evtukh, A A ^a   Litovchenko, V G ^a   Marchenko, R I ^a   Klyui, N I ^a   Popov, V G ^a   Semenovich, V A ^b  

^a INSTITUTE OF HYDROBIOLOGY   (Ukraine)

^b BAKUL INSTITUTE FOR SUPERHARD MATERIALS   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

ARRAYS; CARBON; ELECTRON EMISSION; ELECTRONS; ESTIMATION; ETCHING; ETHANOL; POROUS SILICON; SILICON WAFERS; SURFACES;

ANODIC ETCHING; DIAMOND LIKE CARBON FILMS; FIELD ELECTRON EMISSION; THRESHOLD VOLTAGE; WET CHEMICAL ETCHING;

SILICON;

EID: 0030235502     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1051/jp4:1996519     Document Type: Article

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