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Volumn 283, Issue 1-2, 1996, Pages 45-48
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Surface roughness of PbZrxTi1-xO3 thin films produced by pulsed laser ablation-deposition
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Author keywords
Atomic force microscopy (AFM); Deposition process; Laser ablation; Surface roughness
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Indexed keywords
ACTIVATION ENERGY;
ATOMIC FORCE MICROSCOPY;
DEPOSITION;
INTEGRATED CIRCUIT MANUFACTURE;
LASER ABLATION;
PULSED LASER APPLICATIONS;
SEMICONDUCTING LEAD COMPOUNDS;
SURFACE PHENOMENA;
SURFACE ROUGHNESS;
SURFACE TREATMENT;
DEPOSITION TEMPERATURE;
LASER ENERGY DENSITY;
LEAD ZIRCONIA TITANATE;
OXYGEN PRESSURE;
PULSED LASER ABLATION DEPOSITION;
ROOT MEAN SQUARE TOUGHNESS;
THIN FILMS;
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EID: 0030234996
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/0040-6090(95)08518-1 Document Type: Article |
Times cited : (3)
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References (11)
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