A hybrid phthalocyanine/silicon field-effect transistor sensor for NO2

Thin Solid Films

Volumn 284-285, Issue , 1996, Pages 94-97

  Barker, P S ^a   Petty, M C ^a   Monkman, A P ^a   McMurdo, J ^b   Cook, M J ^b   Pride, R ^c  

^a DURHAM UNIVERSITY   (United Kingdom)

^b UNIVERSITY OF EAST ANGLIA   (United Kingdom)

^c Gas Research Centre   (United Kingdom)

Author keywords

Metal oxide semiconductor structure; Nitrogen dioxide; Sensors; Silicon

Indexed keywords

ABSORPTION SPECTROSCOPY; CHEMICAL SENSORS; COATINGS; GATES (TRANSISTOR); LANGMUIR BLODGETT FILMS; MOSFET DEVICES; NITROGEN OXIDES; ORGANOMETALLICS; SEMICONDUCTOR DEVICE STRUCTURES; SILICON;

GATE VOLTAGE; PHTHALOCYANINE FILMS;

THIN FILMS;

EID: 0030234405     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(95)08279-4     Document Type: Article

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